deposition potential — išskyrimo potencialas statusas T sritis chemija apibrėžtis Elektrocheminio medžiagos išskyrimo pradžios potencialas. atitikmenys: angl. deposition potential rus. потенциал выделения; потенциал осаждения ryšiai: sinonimas – nusodinimo potencialas … Chemijos terminų aiškinamasis žodynas
Potential applications of carbon nanotubes — Carbon nanotubes have many potential applications, here is a list of some of the most important:tructural*clothes: waterproof tear resistant cloth fibers *combat jackets: MIT is working on combat jackets that use carbon nanotubes as ultrastrong… … Wikipedia
Electron beam physical vapor deposition — or EBPVD is a form of physical vapor deposition in which a target anode is bombarded with an electron beam given off by a charged tungsten filament under high vacuum. The electron beam causes atoms from the target to transform into the gaseous… … Wikipedia
Plasma-enhanced chemical vapor deposition — PECVD machine at LAAS technological facility in Toulouse, France. Plasma enhanced chemical vapor deposition (PECVD) is a process used to deposit thin films from a gas state (vapor) to a solid state on a substrate. Chemical reactions are involved… … Wikipedia
Underpotential deposition — (UPD) is a phenomenon of electrodeposition of a species (typically reduction of a metal cation to a solid metal) at a potential less negative than the equilibrium (Nernst) potential for the reduction of this metal.The occurrence of underpotential … Wikipedia
Sputter deposition — is a physical vapor deposition (PVD) method of depositing thin films by sputtering, that is ejecting, material from a target, that is source, which then deposits onto a substrate, such as a silicon wafer. Resputtering is re emission of the… … Wikipedia
Electron beam induced deposition — (EBID) is a process of decomposing gaseous molecules by electron beam leading to deposition of non volatile fragments onto a nearby substrate. Process Focused electron beam of scanning electron microscope (SEM) or scanning transmission electron… … Wikipedia
Chemical vapor deposition of ruthenium — is a method to deposit thin layers of ruthenium on substrate by Chemical vapor deposition (CVD). A unique challenge arises in trying to grow impurity free films of a catalyst in Chemical vapor deposition (CVD). Ruthenium metal activates C H and C … Wikipedia
Combustion chemical vapor deposition — (CCVD) is a chemical process by which thin film coatings are deposited onto substrates in the open atmosphere. Contents 1 History 2 Principles and procedure 3 Remote combustion chemical v … Wikipedia
Copper indium gallium selenide solar cells — Copper indium gallium selenide (CuIn1 xGaxSe2 or CIGS) is a direct bandgap semiconductor useful for the manufacture of solar cells. Because the material strongly absorbs sunlight, a much thinner film is required than of other semiconductor… … Wikipedia
